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Benchmarking of Metal-to-Carbon Nanotube Side Contact Resistance

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5 Author(s)
Zhengchun Liu ; Center for Integrated Electronics, Rensselaer Polytechnic Institute, 110 Eighth Street, Troy, NY 12180 ; Lijie Ci ; Navdeep Bajwa ; Pulickel M. Ajayan
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We report on side-contact resistances of four promising metal/multiwall-carbon-nanotube contacts utilizing transfer length method (TLM) test structures on densified carbon nanotube (CNT) strips formed from vertically-aligned CNT forests. Contact resistances of Ti/CNT, Pd/CNT, Ta/CNT, and W/CNT contacts with the same nominal contact area were extracted to be 40, 49, 108, and 160 ¿, respectively. Rapid thermal annealing at 400 °C for 5 min reduces the Ta/CNT and W/CNT contact resistances while increasing the Ti/CNT and Pd/CNT ones.

Published in:

2008 International Interconnect Technology Conference

Date of Conference:

1-4 June 2008