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Faraday/Ion Mass Spectroscopy Dosimeter for Plasma Immersion Ion Implantation/Plasma Doping Processes of Semiconductor Manufacturing

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2 Author(s)
Shu Qin ; Micron Technol., Inc., Boise, ID ; McTeer, A.

A new method and apparatus called Faraday/ion mass spectroscopy (IMS) dosimeter system is developed and can be used to determine the implanted impurity dose and profile for any molecular or multispecies-based plasma immersion ion implantation (PIII)/plasma doping (PLAD) processes. Good agreement between the boron doses measured by this method and those measured by SIMS has been demonstrated. Because of its direct, real-time, in situ, and close-loop control manner, this method shows a good controllability and repeatability for the PIII/PLAD processes.

Published in:

Plasma Science, IEEE Transactions on  (Volume:36 ,  Issue: 3 )

Date of Publication:

June 2008

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