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This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.