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Novel Use of Discrete SEM Inspection to Supplement and Refine Inline Defect Inspection During 65nm MirrorBit Development

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4 Author(s)
Nagatani, Go ; Spansion Inc., Sunnyvale ; Sakai, S. ; Haijiang Yu ; Bin Yang

As technology nodes continue to shrink, the role of scanning electron microscope (SEM) has become more than just a review tool. Systematic discrete SEM inspections can serve as inline responses to process experiments, providing quantitative defectivity information for defects that may be difficult to identify by common bright field tools. In addition, this methodology provides means to further refine the automated bright field inspection recipes towards the defect of interest.

Published in:

Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on

Date of Conference:

25-27 Sept. 2006

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