Referenced Items are not available for this document.
As technology nodes continue to shrink, the role of scanning electron microscope (SEM) has become more than just a review tool. Systematic discrete SEM inspections can serve as inline responses to process experiments, providing quantitative defectivity information for defects that may be difficult to identify by common bright field tools. In addition, this methodology provides means to further refine the automated bright field inspection recipes towards the defect of interest.
Published in:
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Date of Conference: 25-27 Sept. 2006
- Page(s):
- 321 - 324
- ISSN :
- 1523-553X
- Print ISBN:
- 978-4-9904138-0-4
- INSPEC Accession Number:
- 9878774
- Conference Location :
- Tokyo
- Digital Object Identifier :
- 10.1109/ISSM.2006.4493095
- Product Type:
- Conference Publications
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