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Laser Scattering Microhaze Correlation with Polysilicon Surface Roughness and Impact on Electrical Performance

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6 Author(s)

Laser scattering surface maps of polysilicon films are studied under a range of process conditions. The surface maps are shown to contain information that correlates with polysilicon film morphology which impacts device performance within a CMOS process for the 45 nm node. These surface maps provide whole wafer surface information at a data collection throughput of 1 minute per wafer. They provide a novel and rapid methodology for process tool monitoring that can enhance the line stability.

Published in:

Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on

Date of Conference:

25-27 Sept. 2006