By Topic

Computer Simulation of Electron Scattering by Heavy Atoms Added into Resist for Dry Etch Resistance Enhancement

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
S. Hasegawa ; Microelectronics Research Laboratories, NEC Corporation 4-1-1, Miyazaki, Miyamae-ku, Kawasaki 213, Japan ; Y. Iida

First Page of the Article

Published in:

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Date of Conference:

13-15 Sept. 1983