By Topic

Interference of Surface Plasmon Waves and Plasmon Coupled Waveguide Modes for the Patterning of Thin Film

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Yongjun Lim ; Seoul National Univ., Seoul ; Seyoon Kim ; Hwi Kim ; Jaehoon Jung
more authors

We analyze and propose a thin-film patterning method based on Kretschmann's attenuated total reflection (ATR) configuration where the surface plasmon mode and plasmon coupled waveguide modes coupled into a target photosensitive layer are generated. By analyzing stratified media with the help of extended transfer matrix method, we numerically visualize electromagnetic fields of surface plasmon waves and plasmon coupled waveguide modes. Through the interference of these modes, it is to be shown that our proposed configuration can be used in the optical lithography, especially for the thin-film patterning methods. Feasibility is tested by coating a dielectric layer on the gold layer in the ATR configuration.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:44 ,  Issue: 4 )