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Novel Neutral Beam Etching Processes for Future Nanoscale Devices

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1 Author(s)
Samukawa, S. ; Tohoku Univ., Sendai

In this paper, a highly efficient neutral-beam source is developed to accomplish the ultimate top-down etching for future nanoscale devices. The ultimate etching processes for future sub-50 nm devices in using the new neutral beam sources are introduced.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007