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Investigation of Dual-Focal-Points Optical System with Bright-Field Illumination and Image Processing for UV Nanoimprint Alignment

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5 Author(s)
Nobuhito Suehira ; Leading-Edge Technology Development Headquarters, Canon Inc., E-mail: ; Atsunori Terasaki ; Shingo Okushima ; Junichi Seki
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In this study, a new wide-gap alignment technique was developed for the investigation of dual-focal-points optical system with bright field illumination and image processing for UV nanoimprint.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007