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Realization and simulation of high aspect ratio micro/nano structures by proton beam writing

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5 Author(s)

In this paper, proton beam writing is combined with an aqueous developable-easily stripped negative chemically amplified resist (TADEP: thick aqueous developable epoxy resist) for the realization of high aspect ratio structures. Monte Carlo method is used to simulate PBW in thick resist films. Result shows that resist structures with 280 nm linewidth and aspect ratio of 40 were easily resolved.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007