By Topic

The IMPRINT software: quantitative predictions of the residual resist thickness in nanoimprint

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Nikolaos Kehagias ; Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland ; Vincent Reboud ; Clivia M. Sotomayor Torres ; Vadim Sirotkin
more authors

With the aim of optimizing the stamp geometry, a refined model for simultaneous calculation of the resist viscous flow in nanoimprint lithography (NIL) and the stamp/substrate deformation has been introduced. This model has been realized in the IMPRINT software. The software is designed for use on standard personal computers and provides results well suited for quantitative predictions of the residual resist thickness in NIL. A very good agreement between simulation and experimental results has been obtained. The results confirm the potential of the IMPRINT software as an efficient tool for the reduction of the stamp bending.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007