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Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography

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2 Author(s)
Chien-Hung Lin ; Nat. Tsing Hua Univ., Hsinchu ; Rongshun Chen

The effects of mold geometries and imprinted resist thickness on the polymer flow using numerical simulations during nanoimprint lithography is investigated. The velocity fields, including the lateral and vertical velocity, is studied to describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007