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Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O2 Dry Etching Mask

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7 Author(s)
Yasui, M. ; Kanagawa Ind. Technol. Center, Kanagawa ; Sugiyama, Y. ; Takahashi, M. ; Kaneko, S.
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In this article, the glassy carbon molds using hydrogen silsequioxane (HSQ) patterned by electron beam lithography (EBL) as O2 dry etching mask was fabricated. The use HSQ pattern written by EBL for O2 etching mask showed that the pattern is available for use in an etching mask to O2 plasma.

Published in:

Microprocesses and Nanotechnology, 2007 Digest of papers

Date of Conference:

5-8 Nov. 2007

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