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Large-area Metal Grid Ultraviolet Filter Fabricated by Nanoimprint Lithography

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2 Author(s)
Wen-Di Li ; Princeton Univ., Princeton ; Chou, S.Y.

For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350 nm, peak transmission of 27% at 285 nm and rejection ratio of 20 dB at visible wavelength.

Published in:

Lasers and Electro-Optics, 2007. CLEO 2007. Conference on

Date of Conference:

6-11 May 2007

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