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Fabrication of free-standing fullerene nanowire using direct electron beam writing and sacrificial dry etching

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5 Author(s)

This paper reports a fabrication of doubly-supported free-standing fullerene (C60) nanowires on MEMS structures to propose an integration process of carbon nano-materials to surface-micromachined silicon devices. By irradiating vacuum-deposited fullerene film with electron beam (EB), polymerized fullerene nanowires were patterned. Then, free-standing structures of the fullerene nanowires were obtained by sacrificial etching using XeF2 gas. The fabricated fullerene nanowire was 2 mum long, 400 nm wide and 15 nm thick.

Published in:

Micro Electro Mechanical Systems, 2008. MEMS 2008. IEEE 21st International Conference on

Date of Conference:

13-17 Jan. 2008