By Topic

Rigorous Surface-Potential Solution for Undoped Symmetric Double-Gate MOSFETs Considering Both Electrons and Holes at Quasi NonEquilibrium

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Xing Zhou ; Nanyang Technol. Univ., Singapore ; Zhaomin Zhu ; Rustagi, S.C. ; Guan Huei See
more authors

This paper presents a rigorously-derived analytical solution of the Poisson equation with both electrons and holes in pure silicon, which is applied to the analysis of undoped symmetric double-gate transistors. An implicit surface-potential equation is obtained that can be solved by a second-order Newton-Raphson technique along with an appropriate initial guess. Within the assumption of holes at equilibrium that is being used in the existing literature, the new results, when compared with the models based on one carrier, reveal that missing the other carrier in the formulation results in a singularity in the gate capacitance exactly at flatband, which may give trouble for high-frequency analysis, although the errors in surface potentials are below the nano-volt range for all gate voltages. However, the solution without assuming constant hole imref, as presented in this paper for the first time, further pinpoints the inadequacy in existing theories of surface-potential solutions in double-gate MOSFETs with undoped thin bodies, although its application to transport solutions of terminal current/charge models depends highly on the type of source/drain structures and contacts.

Published in:

Electron Devices, IEEE Transactions on  (Volume:55 ,  Issue: 2 )