By Topic

Versatile method of sub-micro particle pattern formation using self-assembly and two-step transfer

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Takashi Ozaki ; Department of Micro Engineering, Kyoto University, Japan ; Koji Sugano ; Toshiyuki Tsuchiya ; Osamu Tabata

We propose a method of sub-micro particle pattern formation with high productivity, flexibility and accuracy of pattern. The proposed process is composed of template-assisted self-assembly (TASA) for particle self-assembly and subsequent two-step transfer of the assembled particles. In the self-assembly process, the pattern of 70% was successfully self-assembled. In the first transfer step, the transfer yield of 79% was obtained by SAM (self-assembled monolayer) coated carrier substrate. In the second transfer step, the transfer temperature of 115degC provided the maximum transfer yield of 85%. The overall process yield of 48% was achieved by optimized process parameters and it was successfully demonstrated that the proposed method fabricates any sub-micro particle pattern.

Published in:

Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on

Date of Conference:

21-25 Jan. 2007