Versatile method of sub-micro particle pattern formation using self-assembly and two-step transfer

We propose a method of sub-micro particle pattern formation with high productivity, flexibility and accuracy of pattern. The proposed process is composed of Template-Assisted Self-Assembly (TASA) for particle self-assembly and subsequent two-step transfer of the assembled particles. In the self-assembly process, the pattern of 70 % was successfully self-assembled. In the first transfer step, the transfer yield of 79 % was obtained by SAM (Self-Assembled Monolayer) coated carrier substrate. In the second transfer step, the transfer temperature of 115 °C provided the maximum transfer yield of 85 %. The overall process yield of 48 % was achieved by optimized process parameters and it was successfully demonstrated that the proposed method fabricates any sub-micro particle pattern.