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High aspect ratio nano-scale CFX structures fabricated by deep-rie

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3 Author(s)
Takahiro Arakawa ; Major in Nano-science and Nano-engineering, Waseda University 3-4-1, Ohkubo, Shinjuku, Tokyo, 169-8555, Japan ; Hiroyuki Kusakawa ; Shuichi Shoji

High aspect ratio (>500) nano-scale CFx (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CFx nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CFx was controlled from 200 nm to 500 nm, and the height more than 100 mum was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

Published in:

Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on

Date of Conference:

21-25 Jan. 2007