Cart (Loading....) | Create Account
Close category search window

Key directions and a roadmap for electrical design for manufacturability

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Kahng, A.B. ; Univ. of California at San Diego, La Jolla

Semiconductor product value increasingly depends on "equivalent scaling" achieved by design and design-for-manufacturability (DFM) techniques. This talk addresses trends and a roadmap for "equivalent scaling" innovation at the design-manufacturing interface. The first part will discuss precepts of electrical DFM. What are dominant aspects of manufacturing variability and design requirements? Can designs match process, or must process inevitably adapt to designs? In what sense can concepts of "virtual manufacturing" or "statistical optimization" succeed in the design flow? How should design technology balance analyses that preserve value, versus optimizations that extend value? How should we balance preventions (correct by construction), versus early interventions, versus cures (construct by correction), versus "do no harm" opportunism? Or, tools that can model and predict well, versus tools that can make upstream assumptions come true? The second part will give a roadmap for electrical DFM technologies, motivated by emerging challenges (stress/strain engineering, mask errors, double-patterning lithography, etc.) and highlighting needs for les 45 nm nodes.

Published in:

Solid State Circuits Conference, 2007. ESSCIRC 2007. 33rd European

Date of Conference:

11-13 Sept. 2007

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.