Cart (Loading....) | Create Account
Close category search window

Metal Electrode/High-k Dielectric Gate-Stack Technology for Power Management

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)

High-k dielectrics have been intensively investigated during the last decade, and their performance as a gate dielectric has been improved to the level of conventional SiO2-based gate dielectric at an equivalent oxide thickness (EOT) ~1 nm. The understanding on metal electrodes and their interaction with the underlying high-k dielectric has been expanded, and various CMOS device results with metal electrode/high-k gate dielectric stacks have been reported, indicating the maturity of this technology. The next challenges lie in scaling the gate stack to 0.5-nm EOT to extend the usage of the metal electrode/high-k gate dielectric stacks to future technology generations. A new class of high-k dielectric that has a dielectric constant higher than 26 and a barrier height of ~5.0 eV and above will be needed to achieve this target. Recent progress in this so-called higher k dielectric research is summarized, and its benefit to the gate leakage current is discussed. This paper also reviews various extrinsic and intrinsic process-related defects in the deep subnanometer gate stacks and the potential challenges in implementing such a gate-stack system.

Published in:

Electron Devices, IEEE Transactions on  (Volume:55 ,  Issue: 1 )

Date of Publication:

Jan. 2008

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.