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Laterally varying porous silicon optical tunable filter fabricated using a tapered etch mask pattern

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4 Author(s)
Kyungwook Hwang ; Dept. of Phys. & Astron., Seoul Nat. Univ., Seoul ; Sihan Kim ; Park, Yeonsang ; Heonsu Jeon

We fabricated a laterally varying porous silicon (pSi) Fabry-Perot tunable filter by employing the spatially graded pSi etch technique through a tapered etch mask pattern. Reflectance measurements revealed that the tuning range can be made as wide as ~100 nm while the typical transmission bandwidth is ~3 nm in the 1550 nm wavelength range.

Published in:

Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on

Date of Conference:

26-31 Aug. 2007