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Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography

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8 Author(s)
Young-Seok Kim ; Sch. of Inf. & Commun. Eng., INHA Univ., Incheon ; Seok Ho Song ; Sung-Hyun Oh ; Yong-Kyu Choi
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We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.

Published in:

Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on

Date of Conference:

26-31 Aug. 2007