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New Method for Measurement of Electric-Field Distribution on Semiconductors

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4 Author(s)

New electric-field measuring equipment was constructed. The electric-field distribution was obtained from potential distribution measured by a single capacitive probe through numerical calculation by a microcomputer. The single capacitive probe was fabricated with the technique of vacuum evaporation of aluminum and SiO. The electric-field distribution under acoustoelectric current oscillated state in CdS was measured. The electric-field distribution measured by the present method was compared with that obtained by the time derivative of potential.

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Instrumentation and Measurement, IEEE Transactions on  (Volume:26 ,  Issue: 3 )