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Fabrication of Three-Dimensional Nano-Patterns by Inclined Nanoimprinting Lithography

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3 Author(s)
Zhan Liu ; Georgia Inst. of Technol., Atlanta ; Bucknall, David G. ; Allen, M.G.

We report a non-conventional nano fabrication approach, inclined nanoimprint lithography (INIL), which can produce three-dimensional (3D) nano-patterns of varying heights in a single imprinting step with the potential for low cost and high throughput. Such 3-D nano-patterns can be produced using soft lithography without the need for conventional nano-lithography of either the imprinting mold or the substrate, by exploiting the technique of anisotropic de-wetting. We demonstrate the INIL technique using a commercially available nanolithography resist, poly(methyl-alpha-chloroacrylate- co-alpha-methylstyrene), and demonstrate 3D pattern transfer to silicon dioxide using reactive ion etching.

Published in:

Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International

Date of Conference:

10-14 June 2007