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The fabrication of carbon nanostructures by direct writing with a scanning force microscope is described. A conductive atomic force tip is used to collect carbon from a glassy carbon substrate and then redeposit it onto a gold thin film under voltage control. The resulting patterns are examined using the same atomic force microscope and analyzed using x-ray microprobe elemental analysis. These carbon patterns can act as etch masks or integral components of a nanostructure or device. Evidence is presented that the primary mechanism responsible for the carbon deposition is electromigration from the carbon coated atomic force microscope tip. Writing of carbon with linewidths as small as 40 nm is demonstrated.