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Technology, Design, and Implementation of High-K MIM Capacitors for High di/dt Applications: Microprocessor, IO, and Clocking

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12 Author(s)
Sanchez, H. ; Freescale Semicond. Inc., Austin ; Mandhana, O.P. ; Johnstone, B. ; Roberts, D.
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In this work a MIM capacitor used to decouple the internal power supply is shown. The 8fF/um2 planar MIM capacitors of the 90 nm SOI technology are formed by physical vapor deposition of alternating layers of HfO2 and Ta2O5 dielectrics between TaN electrodes.

Published in:

Integrated Circuit Design and Technology, 2007. ICICDT '07. IEEE International Conference on

Date of Conference:

May 30 2007-June 1 2007