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SnO2 Nanorods Prepared by Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

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5 Author(s)
Y. C. Lee ; Nanyang Technol. Univ., Singapore ; O. K. Tan ; Hui Huang ; M. S. Tse
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SnO2 nanorods were successfully deposited on substrate by inductively coupled plasma-enhanced chemical vapor deposition (PECVD) using dibutyltin diacetate (DBTDA) as the precursor. Each of the SnO2 nanorods in situ grown under catalyst- and template-free growth condition and without any substrate heating was found to be [110] oriented single crystal. These needle-shaped nanorods have an average diameter between 5 and 16 nm and a length of 160 to 250 nm from TEM observation. Substrate distance and RF power showed notable effects on the formation of SnO2 nanorods.

Published in:

IEEE Transactions on Nanotechnology  (Volume:6 ,  Issue: 4 )