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Proximity correction of IC layouts using scanner fingerprints

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3 Author(s)
Cork, C. ; Synopsys Inc., Montbonnot ; Depre, L. ; Tyminski, Jacek

The availability of a precise physical description of the imaging system that was used to expose an OPC calibration tests pattern is now possible. This data is available from scanner manufacturers of the tool as built and also by scanner self-metrology in the Fab at any time. This information reduces significant uncertainty when regressing a model used for OPC and allows the creation of more accurate models with better predictability. This paper explores the considerations necessary for best leveraging this data into the OPC model creation flow.

Published in:

Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI

Date of Conference:

11-12 June 2007