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DFB ridge waveguide lasers at λ = 1.53 μm have been fabricated with uniform first-order gratings defined using electron beam lithography. After MOCVD overgrowth of the grating and fabrication of the ridge waveguides the devices have shown thresholds as low as 22 mA and operation in a single longitudinal mode to powers greater than 10 mW. These results demonstrate that electron beam lithography can be successfully used for the fabrication of DFB lasers with the fine pitch required for first-order gratings.
Date of Publication: May 21 1987