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A two-step liquid-phase-epitaxial process has been used to fabricate widegap-emitter Schottky collector transistors. After the growth of the first two epitaxial layers the sample has been structured and then overgrown in a second run. In that way a pn homojunction in the widegap material (InP) underneath the extrinsic base-emitter region and a pn heterojunction under the collector have been formed. First transistors fabricated show a current gain of 10 in the common-emitter configuration.