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Browse Journals & Magazines > Electronics Letters ...> Volume:18 Issue:20 Help

Fabrication of curved structures by electron-beam lithography

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1 Author(s)
Flavin, P.G. ; British Telecom Research Laboratories, Ipswich, UK

The suitability of electron-beam lithography for the fabrication of curved structures, of interest for integrated optical devices, can be limited by the available pattern data formats. Extensions to the input format of a Cambridge Instruments electron-beam microfabricator are reported, which have allowed complex patterns to be easily specified for both mask making and direct writing.

Published in:
Electronics Letters  (Volume:18 ,  Issue: 20 )

Date of Publication: September 30 1982

Page(s):
865 - 867
ISSN :
0013-5194
Digital Object Identifier :
10.1049/el:19820587
Product Type:
Journals & Magazines
Date of Current Version :
11 July 2007
Issue Date :
September 30 1982
Sponsored by :
Institution of Engineering and Technology

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