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The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry

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1 Author(s)
H. A. Froot ; International Business Machines Corporation, Data Systems Division, Hopewell Junction, New York 12533. (914) 897-4960

A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.

Published in:

Reliability Physics Symposium, 1979. 17th Annual

Date of Conference:

April 1979