Referenced Items are not available for this document.
A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported
Published in:
Electronics Letters
(Volume:43
,
Issue:
9
)
Date of Publication: April 26 2007
- Page(s):
- 517 - 519
- ISSN :
- 0013-5194
- INSPEC Accession Number:
- 9445020
- Digital Object Identifier :
- 10.1049/el:20070281
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 07 May 2007
- Issue Date :
- April 26 2007
- Sponsored by :
- Institution of Engineering and Technology
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