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Nano-CMOS Technology for Next Fifteen Years

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2 Author(s)
Iwai, H. ; Frontier Collaborative Res. Center, Tokyo Inst. of Technol. ; Hei Wong

Complementary metal-oxide-semiconductor (CMOS) technology has been developed into the sub-100 nm range. It is expected that the nano-CMOS technology will govern the IC manufacturing for at least another couple of decades. Though there are many challenges ahead, further down-sizing the device to a few nanometers is still on the schedule of International Technology Roadmap for Semiconductors (ITRS). Several technological options for manufacturing nano-CMOS microchips are available or will soon be available. This paper reviews the challenges of nano-CMOS downsizing and manufacturing. We shall focus on the recent progresses on the key technologies for the nano-CMOS IC fabrication in the next fifteen years

Published in:

TENCON 2006. 2006 IEEE Region 10 Conference

Date of Conference:

14-17 Nov. 2006

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