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In-Situ Measurement of Supply-Noise Maps With Millivolt Accuracy and Nanosecond-Order Time Resolution

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8 Author(s)
Yusuke Kanno ; Central Res. Lab., Hitachi, Ltd, Tokyo ; Yuki Kondoh ; Takahiro Irita ; Kenji Hirose
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An in situ measurement scheme for generating supply-noise maps, which can be conducted while running applications in product-level LSIs, was developed. The design of the on-chip voltage sampling probe is based on a simple ring oscillator, which converts local supply difference between VDD and VSS to oscillation-frequency deviation. High measurement accuracy is achieved by off-chip digital signal processing and calibration. This scheme was used to successfully measure 69-mV local supply noise with 5-ns time resolution in a 3G-cellular-phone processor. It will thus help in designing power-supply networks and in visually verifying the quality of a power supply

Published in:

IEEE Journal of Solid-State Circuits  (Volume:42 ,  Issue: 4 )