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Impact of High-k Gate Dielectrics on the Device and Circuit Performance of Nanoscale FinFETs

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2 Author(s)
Manoj, C.R. ; Dept. of Electr. Eng., Indian Inst. of Technol. Bombay, Mumbai ; Ramgopal Rao, V.

The impact of high-k gate dielectrics on device short-channel and circuit performance of fin field-effect transistors is studied over a wide range of dielectric permittivities k. It is observed that there is a decrease in the parasitic outer fringe capacitance Cof in addition to an increase in the internal fringe capacitance Cif with high-k dielectrics, which degrades the short-channel effects significantly. It is shown that fin width scaling is the most suitable approach to recover the degradation in the device performance due to high-k integration. Furthermore, from the circuit perspective, for the 32-nm technology generation, the presence of an optimum k for a given target subthreshold leakage current has been identified by various possible approaches such as fin width scaling, fin-doping adjustment, and gate work function engineering

Published in:

Electron Device Letters, IEEE  (Volume:28 ,  Issue: 4 )