By Topic

Photonic Crystal Cavity Lasers Patterned by a Combination of Holography and Photolithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Cho, Chi-O ; LCD Dev. Center, Samsung Electron. Co., Chungnam ; Lee, Joonhee ; Park, Yeonsang ; Roh, Yeong-Geun
more authors

Air-bridge-type InGaAsP photonic crystal cavity lasers (PCCLs) have been fabricated by employing a combined lithographic technique of laser holography (LH) and photolithography. Cavities of 4-5 mum in diameter were formed photolithographically on a square-lattice photonic crystal background pattern which was predefined by the LH process. Despite structural imperfections originated from the inevitable pattern misalignment during the combination lithography, 40% or higher of the PCCLs lased. Removal of modal degeneracy due to symmetry breaking, which was confirmed by computer simulations, provided a rationale on this rather unexpected result: the structurally imperfect PCCLs (as defined by our combination lithography) might compete with the so-called perfect PCCLs (as defined by, say, the electron-beam lithography) in terms of cavity Q-factor

Published in:

Photonics Technology Letters, IEEE  (Volume:19 ,  Issue: 8 )