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Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination

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3 Author(s)
Lin, J.-C. ; Dept. of Electron. Eng., St. John''s Univ., Taipei ; Tsai, W.-C. ; Chen, W.-L.

A novel electrochemical etching on silicon is proposed. A pulsed voltage or a pulsed illumination is used to make a pulsed anodic current that produces a magnetic field around the anodic current path. The Lorentz force centralises the hole accumulating path. Disperse pipe trench patterns can then be obtained

Published in:

Electronics Letters  (Volume:43 ,  Issue: 4 )

Date of Publication:

February 15 2007

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