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Fabrication of novel silicon-on-insulator substrates using plasma-based technology

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1 Author(s)
Chu, P.K. ; Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon

Plasma-based nanotechnologies benefit the development of deep-submicrometer microelectronic devices. Recent works conducted in our laboratory pertaining to the production of novel silicon-on-insulator (SOI) materials to reduce the self-heating effects and the use of plasma hydrogenation to conduct ion-cutting are described in this invited paper

Published in:

Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on

Date of Conference:

Oct. 2006