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Impact of Lithographic Grid Irregularity Assessed on Photonic Crystal Device Selectivity

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7 Author(s)
Martinelli, L. ; Lab. Charles Fabry de l''Inst. d''Optique, CNRS, Palaiseau ; Benisty, H. ; Drisse, O. ; Derouin, E.
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The gridding irregularities of electron beam lithography may deterministically disorder photonic crystals (PhC). Their practical impact is addressed on a PhC wavelength selective device using a large grid size of 8 nm. The device operation, based on confined resonances and propagation mini-stopbands in a multimode waveguide, is deterministically blurred. Scattering length scales are correspondingly discussed. Strategies for higher throughput lithography are proposed accordingly

Published in:

Photonics Technology Letters, IEEE  (Volume:19 ,  Issue: 5 )