By Topic

Million-Q Reflection-Based Integrated Resonators Patterned With Deep Ultraviolet Photolithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Greiner, C.M. ; LightSmyth Technol. Inc., Eugene, OR ; Iazikov, D. ; Mossberg, T.W.

We describe million-Q one- and two-dimensional integrated reflective resonators based on ultralow-loss etched Bragg reflectors patterned on silica-on-silicon slab and channel waveguides using deep ultraviolet photoreduction lithography. Measured device performance, obtained in the limit of high reflectivity, provides insights in loss mechanisms operative in the subject systems. Implementation of integrated reflection-based resonators with high-Q and finesse values promises new directions in photonic integration with applications in sensing, filtering, and signal transport

Published in:

Photonics Technology Letters, IEEE  (Volume:18 ,  Issue: 24 )