A novel on-chip Bragg cladding waveguide is designed and fabricated using conventional CMOS techniques. This optical waveguide has a low refractive index core surrounded by high index-contrast cladding bilayers. Polysilicon <formula formulatype="inline"><tex>$(n = 3.5)$</tex></formula> and silicon nitride <formula formulatype="inline"><tex>$(n=2.0)$</tex></formula> are used for high index-contrast Bragg layers, where index difference is as high as 1.5. Our simulation shows that sharp bending in low index core materials can be achieved, which is not possible using index guiding mechanism. Within our approach, various on-chip applications are expected such as optical integration, high power transmission, biosensor/microelectromechanical system and so on.