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Preparation of a new organic/inorganic hybrid film PVDF/SiO2 by sol-gel process

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2 Author(s)
Wei Bai ; Dept. of Mater. Sci. & Eng., Univ. of Electron. Sci. & Technol. of China, Chengdu, China ; Daben Yang

We have developed a new technology related to the sol-gel process for manufacturing hybrid film PVDF/SiO2. This hybrid film is a new dielectric film, and has remarkable dielectric and flexible features. In our experiment, it is found that the solution viscosity of SiO2 and PVDF is one of the most important factors for forming high quality hybrid film PVDF/SiO2. The experimental results show: hybrid film PVDF/SiO2 is transparent and flexible, its dielectric constant ε=2.81~8.57, and dissipation factor tan δ is less than 1×10-4 at 1 MHz with 1:1 weight fraction of PVDF/SiO2

Published in:
Electrical Insulation, 1994., Conference Record of the 1994 IEEE International Symposium on

Date of Conference: 5-8 Jun 1994

Page(s):
590 - 591
Meeting Date :
05 Jun 1994-08 Jun 1994
ISSN :
1089-084X
Print ISBN:
0-7803-1942-7
INSPEC Accession Number:
4979914
Conference Location :
Pittsburgh, PA
Digital Object Identifier :
10.1109/ELINSL.1994.401386
Product Type:
Conference Publications

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