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Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach (MOS test structure)

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4 Author(s)
Walls, J.A. ; Microfabrication Facility, Edinburgh Univ., UK ; Walton, A.J. ; Robertson, J.M. ; Crawford, T.M.

The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.

Published in:
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on

Date of Conference: 13-14 March 1989

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