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A line extraction method for automated SEM inspection of VLSI resist

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4 Author(s)
D. B. Shu ; Dept. of Electr. Eng., Pittsburgh Univ., PA, USA ; C. C. Li ; J. F. Mancuso ; Y. N. Sun

A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform

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IEEE Transactions on Pattern Analysis and Machine Intelligence  (Volume:10 ,  Issue: 1 )