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Model-based control of semiconductor processing equipment: rapid thermal processing example

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3 Author(s)
Gyurcsik, R.S. ; Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA ; Cavin, R.K. ; Sorrell, F.Y.

Analytical and empirical based models have been incorporated into the real-time control of rapid thermal processing equipment to improve both absolute temperature control and uniformity. This paper describes the special control needs of RTP systems along with a detailed description or an RTP model

Published in:

Systems, Man and Cybernetics, 1993. 'Systems Engineering in the Service of Humans', Conference Proceedings., International Conference on

Date of Conference:

17-20 Oct 1993

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