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Micromachined sensors using polysilicon sacrificial layer etching technology

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4 Author(s)
Sugiyama, S. ; Toyota Central Res. & Dev. Labs. Inc., Aichi, Japan ; Tabata, O. ; Shimaoka, K. ; Asahi, R.

Sensor assembly is one of the key technologies to improve the cost performance of silicon sensors. As a technology to achieve this aim, polysilicon sacrificial layer etching technology is presented. As its applications, a microdiaphragm pressure sensor with a reference pressure chamber and an integrated pyroelectric infrared sensor with a thermal isolated structure are also presented. Fabrication of a micro optical chopper is shown, and the future style of sensor devices is proposed.<>

Published in:

Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International

Date of Conference:

11-14 Dec. 1994

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