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Browse Journals & Magazines > Instrumentation and Measureme ...> Volume:44 Issue:2 Help

Verification of on-wafer noise parameter measurements

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3 Author(s)
Boudiaf, Ali ; EMO-ENSEA, Cergy Pontoise Cedey, France ; Dubon-Chevallier, C. ; Pasquet, D.

Using a thin film technology, we have designed and fabricated a new passive device for noise parameter measurement test instrumentation verification. The main feature specifying this device is the same order of magnitude for input-output reflection coefficients and for noise parameters, as for low-noise field effect transistors. This new device is useful as a verification artifact, suited for on-wafer measurements due to its small size and wide operation bandwidth

Published in:
Instrumentation and Measurement, IEEE Transactions on  (Volume:44 ,  Issue: 2 )

Date of Publication: Apr 1995

Page(s):
332 - 335
ISSN :
0018-9456
INSPEC Accession Number:
4953394
Digital Object Identifier :
10.1109/19.377845
Date of Current Version :
06 August 2002
Issue Date :
Apr 1995
Sponsored by :
IEEE Instrumentation and Measurement Society

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