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Large area fine line patterning by scanning projection lithography

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3 Author(s)
Muller, H.G. ; TAMARACK Sci., Anaheim, CA, USA ; Yanrong Yuan ; Sheets, R.E.

A new type of photolithography tool has been developed, addressing the specific needs of MCM manufacture. It is based on scanning projection exposure. It can expose panels at variable sizes up to 500 mm by 600 mm (typical laminate size), with an optical resolution of less than 5 μm and an overlay accuracy of 2 μm (typical thin film design rules). With the exposure being a mask projection, mask damage and subsequent yield problems are generally avoided

Published in:

Components, Packaging, and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on  (Volume:18 ,  Issue: 1 )