By Topic

Magnetic properties of Ni-Fe films prepared by a DC triode sputtering method

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
R. Minakata ; Sharp Corp., Nara, Japan

The magnetic properties of Ni-Fe films with 81-wt.% Ni prepared by a DC triode sputtering method are studied as functions of sputtering parameters. Two kinds of substrates are used: one is flat and the other is patterned. In the former case sufficiently low coercive forces are obtained when both the target voltage and the Ar pressure are kept below the critical values. In the latter case, a negative substrate bias voltage is necessary to improve the magnetic properties in addition to the previous conditions.

Published in:

IEEE Transactions on Magnetics  (Volume:24 ,  Issue: 3 )