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The magnetic properties of Ni-Fe films with 81-wt.% Ni prepared by a DC triode sputtering method are studied as functions of sputtering parameters. Two kinds of substrates are used: one is flat and the other is patterned. In the former case sufficiently low coercive forces are obtained when both the target voltage and the Ar pressure are kept below the critical values. In the latter case, a negative substrate bias voltage is necessary to improve the magnetic properties in addition to the previous conditions.